Variable-angle transmittance measurement attachment with polarizer option

In semiconductor industry, infrared spectroscopy is widely used for various routine analysis such as quantitative analysis of impurities like oxygen and carbon, qualitative analysis of insulator film and film thickness analysis of epitaxial film etc. as well as basic researches.

Among several analytical methods, the transmission method is the most popular one in those applications, however, Silicon Wafer has high reflectance, which may cause such symptom that the reflected light from surface of Silicon Wafer returns to interferometer, resulting the noise on spectrum due to water vapor since the length of optical path with sample is different from the length without sample.

Jasco VAT-500i Variable-angle transmittance measurement attachment can be used for such difficult applications of samples with reflectance. In this attachment by changing the incident angle of light against the sample surface, the reflected light would not go into interferometer. In fact, this design can drastically reduce the level of noise due to water vapor even the incident angle is changed as small as 10 to 20 degree.